The kinetics and mechanisms of elementary NF2 reactions with O and N atoms-Reference-Cited by-同舟云学术

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The kinetics and mechanisms of elementary NF2 reactions with O and N atoms

Published:1983-05 Issue:5 Volume:15 Page:399-415
ISSN:0538-8066
Container-title:International Journal of Chemical Kinetics
language:en
Short-container-title:Int. J. Chem. Kinet.

Author:

Gershenzon Yu. M.,Il'in S. D.,Kishkovitch O. P.,Malkhasyan R. T.,Rozenshtein V. B.,Umanskii S. Ya.

Publisher

Wiley

Subject

Inorganic Chemistry,Organic Chemistry,Physical and Theoretical Chemistry,Biochemistry

Reference30 articles.

1. Hydrogen Fluoride Elimination Chemical Laser from N,N‐Difluoromethylamine

2. The chemical production of electronically excited states in the H/NF2 system

3. Detection of the ground state FO radical in the gas phase

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical and mass spectrometric measurements of dissociation in low frequency, high density, remote source O2/Ar and NF3/Ar plasmas;Journal of Vacuum Science & Technology A;2020-03

2. Photoreduction of nitrogen trifluoride with controlled release of radicals;Journal of Chemical Technology & Biotechnology;2013-07-29

3. Gas-phase atom-radical kinetics of elementary trifluoromethyl reactions with oxygen and nitrogen atoms;The Journal of Physical Chemistry;1989-03

4. Fluorine and Nitrogen;F Fluorine;1986

5. Kinetics of the H2–NF2 system;The Journal of Chemical Physics;1985-09-15

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