Atomically dispersed Pt to boost adjacent frustrated Lewis pair for 2,6‐diamino‐3,5‐dinitropyridine hydrogenation

Author:

Yao Chang1,Li Wenhua1,Li Yurou1,Cao Yueqiang12ORCID,Zhang Jing1ORCID,Qian Gang1,Zhou Xinggui1ORCID,Duan Xuezhi1ORCID

Affiliation:

1. State Key Laboratory of Chemical Engineering, School of Chemical Engineering East China University of Science and Technology Shanghai China

2. Engineering Research Center of Resource Utilization of Carbon‐containing Waste with Carbon Neutrality, Ministry of Education Shanghai China

Abstract

AbstractAchieving atomic‐level control over local environment of metal oxide to boost catalytic activity is challenging yet significant for heterogeneous hydrogenations. Herein, we propose anchoring atomically dispersed Pt species onto indium oxide using a precisely conditioned atomic layer deposition (ALD) technology to manipulate the local electronic properties of In2O3 toward enhanced hydrogenation of 2,6‐diamino‐3,5‐dinitropyridine (DADNP) to 2,3,5,6‐tetraaminopyridine (TAP). Experimental and theoretical studies unravel that the isolated Pt atoms localize the electron density surrounding them and thus activate the adjacent frustrated Lewis pair for hydrogen activation. In addition, the adsorption of DADNP is enhanced by such regulation, while that of TAP is suppressed on the Pt1‐In2O3 catalyst. The as‐synthesized Pt1‐In2O3 catalyst thus exhibits 91.7% of TAP selectivity at 100% conversion of DADNP, demonstrating remarkably improved catalytic performances as compared with the In2O3 catalyst for DADNP hydrogenation.

Funder

National Natural Science Foundation of China

Program of Shanghai Academic Research Leader

Publisher

Wiley

Subject

General Chemical Engineering,Environmental Engineering,Biotechnology

Reference48 articles.

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