The Preparation of Titanium-Based Thin Film by CVD Using Titanium Chlorides as Precursors
Author:
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Metals – Gas-Phase Deposition and Applications;Comprehensive Inorganic Chemistry II;2013
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3. Ti5Si3 Nanowire and Its Field Emission Property;Chemistry of Materials;2008-03-11
4. Heteroepitaxial Growth of Nanostructured Cerium Dioxide Thin Films by MOCVD on a (001) TiO2 Substrate;Chemistry of Materials;2003-03-14
5. Synthesis and Characterization of Volatile, Fluorine-Free β-Ketoiminate Lanthanide MOCVD Precursors and Their Implementation in Low-Temperature Growth of Epitaxial CeO2 Buffer Layers for Superconducting Electronics;Inorganic Chemistry;2002-09-10
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