INSAP: In Situ Surface Adduct Passivation as a New Route to the Protection and Functionalization of III–V Surfaces Following MOCVD Growth
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Published:1998-10
Issue:05
Volume:04
Page:190-192
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ISSN:0948-1907
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Container-title:Chemical Vapor Deposition
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language:
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Short-container-title:Chem. Vap. Deposition
Author:
Pemble Martyn E.,Yates Heather M.,Yates Rebecca F.
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry