Thin Films

Author:

Wahl Georg1,Davies Paul B.2,Bunshah Rointan F.3,Joyce Bruce A.4,Bain Colin D.5,Wegner Gerhard6,Remmers Markus6,Walsh Francis C.7,Hieber Konrad8,Sundgren Jan-Eric9,Bachmann Peter K.10,Miyazawa Shintaro11,Thelen Alfred12,Strathmann Heiner13,Edler Karen J.14

Affiliation:

1. Technische Universität Braunschweig; Institut für Oberflächentechnik; Braunschweig Germany

2. University of Cambridge; Department of Chemistry; Cambridge United Kingdom

3. University of California; Department of Materials Science and Engineering; Los Angeles United States

4. University of London; Imperial College of Science, Technology and Medicine; London United Kingdom

5. University of Oxford; Physical Chemistry Laboratory; Oxford United Kingdom

6. Max-Planck-Institut für Polymerforschung; Mainz Germany

7. University of Portsmouth; Department of Chemistry; Portsmouth United Kingdom

8. Fraunhofer Gesellschaft; Institut für Festkörpertechnologie; München Germany

9. Linköping University; Department of Physics and Measurement Technology; Linköping Sweden

10. Philips GmbH; Research Laboratories; Aachen Germany

11. NTT LSI Laboratories; Kanagawa Japan

12. Ingenieurbüro Thelen für optische Interferenzschichten; Schmitten-Seelenberg Germany

13. University of Twente; Faculty of Chemical Technology; Enschede The Netherlands

14. University of Bath; Department of Chemistry; Claverton Down Bath BA2 United Kingdom 7AY

Publisher

Wiley-VCH Verlag GmbH & Co. KGaA

Reference259 articles.

1. K. Jensen G.W. Cullen 1993

2. CVD of Compound Semiconductors

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