62‐4: Late‐News Paper: Evaluation of polycrystalline silicon after Excimer laser annealing by Retardation measurement method
Author:
Affiliation:
1. Samsung Display Co., Ltd. Yongin-City Korea
Publisher
Wiley
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/sdtp.13064
Reference11 articles.
1. XeCl Excimer Laser Annealing Used to Fabricate Poly-Si Tfts
2. Phase transformation mechanisms involved in excimer laser crystallization of amorphous silicon films
3. Laser Crystallization for Polycrystalline Silicon Device Applications
4. Laser-Induced Periodic Surface Structure on Solids: A Universal Phenomenon
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1. Guided-mode Resonances in Periodic Surface Structures Induced on Si Thin Film by a Laser;KOREAN J OPT PHOTONI;2023
2. Guided-mode resonance in periodic surface textures on Si thin films induced by nanosecond laser irradiation;Photonics and Nanostructures - Fundamentals and Applications;2021-07
3. Interlayer couplings in silicon/oxide/nitride thin films via laser crystallizations;AIP Advances;2021-03-01
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