A Practical ITO Replacement Strategy: Sputtering-Free Processing of a Metallic Nanonetwork-Reference-Cited by-同舟云学术

A Practical ITO Replacement Strategy: Sputtering-Free Processing of a Metallic Nanonetwork

Published:2017-05-30 Issue:8 Volume:2 Page:1700061
ISSN:2365-709X
Container-title:Advanced Materials Technologies
language:en
Short-container-title:Adv. Mater. Technol.

Author:

Xian Zhike¹²,Han Bing¹,Li Songru¹,Yang Chaobin³,Wu Sujuan¹,Lu Xubing¹,Gao Xingsen¹,Zeng Min¹,Wang Qianming⁴,Bai Pengfei²,Naughton Michael J.³,Zhou Guofu²,Liu Jun-Ming¹⁵,Kempa Krzysztof¹³,Gao Jinwei¹

Affiliation:

1. Institute for Advanced Materials and Guangdong Provincial; Key Laboratory of Quantum Engineering and Quantum Materials; Academy of Advanced Optoelectronics; South China Normal University; Guangzhou 510006 China

2. Institute of Electronic Paper Displays; Academy of Advanced Optoelectronics; South China Normal University; Guangzhou 510006 China

3. Department of Physics; Boston College; Chestnut Hill MA 02467 USA

4. School of Chemistry & Environment; South China Normal University; Guangzhou 510006 China

5. Laboratory of Solid State Microstructures; Nanjing University; Nanjing 210093 China

Funder

National Natural Science Foundation of China

Guangdong Science and Technology Department

Boston College

Guangdong Innovative Research Team Program

Publisher

Wiley

Subject