Solvent Vapor Annealing of a Diblock Copolymer Thin Film with a Nonselective and a Selective Solvent: Importance of Pathway for the Morphological Changes-Reference-Cited by-同舟云学术

Solvent Vapor Annealing of a Diblock Copolymer Thin Film with a Nonselective and a Selective Solvent: Importance of Pathway for the Morphological Changes

Published:2020-06-16 Issue:14 Volume:41 Page:2000150
ISSN:1022-1336
Container-title:Macromolecular Rapid Communications
language:en
Short-container-title:Macromol. Rapid Commun.

Author:

Jung Florian A.¹,Berezkin Anatoly V.¹,Tejsner Tim B.²,Posselt Dorthe²,Smilgies Detlef‐M.³,Papadakis Christine M.¹^ORCID

Affiliation:

1. Technische Universität München Physik‐Department Physik der weichen Materie James‐Franck‐Str. 1 Garching 85748 Germany

2. IMFUFA Department of Science and Environment Roskilde University P.O. Box 260 Roskilde 4000 Denmark

3. Cornell High Energy Synchrotron Source (CHESS) Wilson Laboratory Cornell University Ithaca NY 14853 USA

Funder

Deutsche Forschungsgemeinschaft

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Organic Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/marc.202000150

Reference52 articles.

1. Block Copolymer Thin Films: Physics and Applications

2. Patterning with block copolymer thin films

3. Ordering in thin films of block copolymers: Fundamentals to potential applications

4. Phase Diagram of Diblock Copolymers Confined in Thin Films

5. Controlling Thermochromism in a Photonic Block Copolymer Gel

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