Kinetics of the reduction of silicon tetrachloride and trichlorosilane by hydrogen
Author:
Publisher
Wiley
Subject
General Earth and Planetary Sciences,General Environmental Science
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/jctb.5010181202/fullpdf
Reference19 articles.
1. Epitaxial Silicon Films by the Hydrogen Reduction of SiCl[sub 4]
2. Kinetics of Silicon Crystal Growth from SiCl[sub 4] Decomposition
3. �ber die Reduktion von Chlorsilanen mit Wasserstoff
4. Vapor Phase Deposition and Etching of Silicon
5. Epitaxial Growth of Silicon by Hydrogen Reduction of SiHCl[sub 3] onto Silicon Substrates
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Homogeneous and Heterogeneous Chemistry Models of the Codeposition of Silica, Alumina, and Aluminosilicates;Journal of The Electrochemical Society;2002
2. Mathematical Modeling of the Gas-Phase Chemistry in the Decomposition of Chlorosilanes in Mixtures of Carbon Dioxide and Hydrogen at High Temperatures;Journal of The Electrochemical Society;2002
3. Model for the Formation of Silicon Carbide from the Pyrolysis of Dichlorodimethylsilane in Hydrogen: I, Silicon Formation from Chlorosilanes;Journal of the American Ceramic Society;1993-01
4. Model for the Formation of Silicon Carbide from the Pyrolysis of Dichlorodimethylsilane in Hydrogen: II, Silicon Carbide Formation from Silicon and Methane;Journal of the American Ceramic Society;1993-01
5. Kinetic Modelling of the Deposition of SiC from Methyltrichlorosilane;MRS Proceedings;1991
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