Ion Sources Used for Secondary Ion Mass Spectrometry
Author:
Publisher
John Wiley & Sons, Inc.
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/9781118589335.ch3/fullpdf
Reference51 articles.
1. Sur la réalisation d'un rayonnement matériel d'origine purement thermique. Cinétique expérimentale
2. Ion Source for Mass Spectrography
3. Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 ev
4. An investigation of thermal spikes by studying the high energy sputtering of metals at elevated temperatures
5. Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Principles of the Construction and Computer Simulation of a Source of Homogeneous and Heterogeneous Cluster Ions;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2018-01
2. On the possibility of using the nanosize effect of ion sputtering in the development of a high-current source of atomic and cluster ions of solid-state elements;Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques;2015-11
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