Controllable Patterning of Hybrid Silicon Nanowire and Nanohole Arrays by Laser Interference Lithography-Reference-Cited by-同舟云学术

Controllable Patterning of Hybrid Silicon Nanowire and Nanohole Arrays by Laser Interference Lithography

Published:2020-03-23 Issue:6 Volume:14 Page:2000024
ISSN:1862-6254
Container-title:physica status solidi (RRL) – Rapid Research Letters
language:en
Short-container-title:Phys. Status Solidi RRL

Author:

Guo Xudong¹²,Li Songhao¹,Lei Zecheng¹,Liu Ri¹,Li Li¹,Wang Lu¹,Dong Litong¹,Peng Kuiqing³,Wang Zuobin¹^ORCID

Affiliation:

1. International Research Centre for Nano Handling and Manufacturing of China (CNM) Changchun University of Science and Technology Changchun 130022 China

2. Department of Electrical and Computer Engineering University of Maryland College Park MD 20742 USA

3. Department of Physics Beijing Key Laboratory of Energy Conversion and Storage Materials Beijing Normal University Beijing 100875 China

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssr.202000024

Reference33 articles.

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5. Subwavelength-thick lenses with high numerical apertures and large efficiency based on high-contrast transmitarrays

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