1. and , New Oxidation Methods for the Removal of Recalcitrant Organic Impurities, paper accepted for presentation at the 1996 lES Meeting.
2. in Contamination Control and Defect Reduction, D. N. Schmidt, Editor., ECS Proceedings, Vol. 94–9, p. 222 (1994).
3. , , , , , in Cleaning Technology in Semiconductor Device Manufacturing, J. Ruzyllo, Editor, ECS Proceedings., Vol. 94–7, p. 140 (1994).
4. Process Simulation for Analysis of TOC Removal and Buildup in Polishing Loops with Recycle, Sematech Industrial Advisory Meeting and Workshop, Austin, TX, (1994). Available as a Sematech publication.