Atomic Layer Deposition of Titanium Oxide from TiI4 and H2O2-Reference-Cited by-同舟云学术

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Atomic Layer Deposition of Titanium Oxide from TiI4 and H2O2

Published:2000-11 Issue:6 Volume:6 Page:303-310
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Kukli K.,Ritala M.,Schuisky M.,Leskelä M.,Sajavaara T.,Keinonen J.,Uustare T.,Hårsta A.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Cited by 60 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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