Tetramethylammonium Hydroxide Poisoning during a Pallet Cleaning Demonstration-Reference-Cited by-同舟云学术

Tetramethylammonium Hydroxide Poisoning during a Pallet Cleaning Demonstration

Published:2013-03 Issue:2 Volume:55 Page:120-124
ISSN:1341-9145
Container-title:Journal of Occupational Health
language:en
Short-container-title:Jrnl of Occup Health

Author:

Park Seung‐Hyun¹,Park Jungsun¹,You Ki‐Ho¹,Shin Hae‐Chul²,Kim Hyun‐Ock³

Affiliation:

1. Occupational Safety and Health Research Institute, Korea Occupational Safety and Health AgencyRepublic of Korea

2. Gyeonggi Nambu Area office, Korea Occupational Safety and Health AgencyRepublic of Korea

3. Department of Occupational HealthKorea Occupational Safety and Health AgencyRepublic of Korea

Publisher

Wiley

Subject

Public Health, Environmental and Occupational Health

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1539/joh.12-0143-CS

Reference16 articles.

1. Tetramethylammonium hydroxide poisoning

2. TanakaA SakamotoK YonedaY YokouchiK inventors; Nippon Zeon Co. Ltd. Fujitsu limited assignees.Developer for photosensitive polyimide resin composition. United States Patent US 6403289 B1.2002Jun 11.

3. KanadaT HanahataH JinX WajiS inventors; Asahi Kasei EMD corporation PI R&D Co. Ltd. assignees.Positive photosensitive resin composition. United States Patent US 20090267239 A1.2009Oct 29.

4. GeistJ inventor; Optical ETC Inc. assignee.Method for TMAH etching of CMOS integrated circuits. United States Patent US 7094696 B2.2006Aug 22.

5. AndreasM MorganPA inventors; Micron Technology Inc. assignee.Wafer cleaning method and resulting wafer. United States Patent US 6930017 B2.2005Aug 16.

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