The Field Emission Properties of Graphene Aggregates Films Deposited on Fe-Cr-Ni alloy Substrates-Reference-Cited by-同舟云学术

The Field Emission Properties of Graphene Aggregates Films Deposited on Fe-Cr-Ni alloy Substrates

Published:2010 Issue: Volume:2010 Page:1-4
ISSN:1687-4110
Container-title:Journal of Nanomaterials
language:en
Short-container-title:Journal of Nanomaterials

Author:

Lu Zhanling¹,Wang Wanjie¹,Ma Xiaotian¹,Yao Ning²,Zhang Lan³,Zhang Binglin³

Affiliation:

1. School of Materials Science and Engineering, Zhengzhou University, Zhengzhou 450001, China

2. Materials Physics Laboratory of Education Ministry of China, Zhengzhou University, Zhengzhou 450052, China

3. Department of Engineering Mechanics, Zhengzhou University, Zhengzhou 450001, China

Abstract

The graphene aggregates films were fabricated directly on Fe-Cr-Ni alloy substrates by microwave plasma chemical vapor deposition system (MPCVD). The source gas was a mixture of and with flow rates of 100 sccm and 12 sccm, respectively. The micro- and nanostructures of the samples were characterized by Raman scattering spectroscopy, field emission scanning electron microscopy (SEM), and transparent electron microscopy (TEM). The field emission properties of the films were measured using a diode structure in a vacuum chamber. The turn-on field was about 1.0 V/m. The current density of 2.1 mA/ at electric field of 2.4 V/m was obtained.

Publisher

Hindawi Limited

Subject

General Materials Science

Link

http://downloads.hindawi.com/journals/jnm/2010/148596.pdf

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