On Topological Analysis of Entropy Measures for Silicon Carbides Networks

Author:

Wang Xing-Long1,Siddiqui Muhammad Kamran2ORCID,Kirmani Syed Ajaz K.3,Manzoor Shazia2ORCID,Ahmad Sarfraz2ORCID,Dhlamini Mlamuli4ORCID

Affiliation:

1. Department of General Education, Anhui Xinhua University, Hefei 230000, China

2. Department of Mathematics, COMSATS University Islamabad, Lahore Campus, Lahore, Pakistan

3. Department of Electrical Engineering, College of Engineering, Qassim University, Unaizah, Saudi Arabia

4. Department of Applied Mathematics, National University of Science and Technology, Bulawayo, Zimbabwe

Abstract

The silicon material has provoked and stimulated significant research concern to a considerable extent taking into account its marvelous mechanical, optical, and electronic properties. Naturally, silicons are semiconductors and are utilized in the formation of various materials. For example, it is used in assembling the electronic based gadgets. In this article, we have studied the 2 D structure of silicon carbide Si 2 C 3 I m , n and Si 2 C 3 I I m , n and then continued to discuss some degree grounded topological descriptors in association with their corresponding entropy measures. We extend this computation to the quantitative and pictorial comparisons which could be beneficial in the structure amendment for effective implementation.

Funder

Domestic Visiting and Study Program for Outstanding Young Backbone Talents in Universities

Publisher

Hindawi Limited

Subject

Multidisciplinary,General Computer Science

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