100 nm AlSb/InAs HEMT for Ultra-Low-Power Consumption, Low-Noise Applications

Author:

Gardès Cyrille1ORCID,Bagumako Sonia1,Desplanque Ludovic1,Wichmann Nicolas1,Bollaert Sylvain1,Danneville François1,Wallart Xavier1,Roelens Yannick1ORCID

Affiliation:

1. Institut d’Électronique de Microélectronique et de Nanotechnologie (IEMN), UMR CNRS 8520, Université Lille I, BP 60069, 59652 Villeneuve d’Ascq Cedex, France

Abstract

We report on high frequency (HF) and noise performances of AlSb/InAs high electron mobility transistor (HEMT) with 100 nm gate length at room temperature in low-power regime. Extrinsic cut-off frequenciesfT/fmaxof 100/125 GHz together with minimum noise figureNFmin=0.5 dB and associated gainGass=12 dB at 12 GHz have been obtained at drain bias of only 80 mV, corresponding to 4 mW/mm DC power dissipation. This demonstrates the great ability of AlSb/InAs HEMT for high-frequency operation combined with low-noise performances in ultra-low-power regime.

Funder

National Research Agency

Publisher

Hindawi Limited

Subject

General Environmental Science,General Biochemistry, Genetics and Molecular Biology,General Medicine

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. High-Frequency Noise Characterization and Modeling of Graphene Field-Effect Transistors;IEEE Transactions on Microwave Theory and Techniques;2020-06

2. GaSbBi Alloys and Heterostructures: Fabrication and Properties;Bismuth-Containing Alloys and Nanostructures;2019

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