Adaptive Step-Size Control in Simulation of Diffusive CVD Processes

Abstract

We present control strategies of a diffusion process for chemical vapor deposition for metallic bipolar plates. In the models, we discuss the application of different models to simulate the plasma-transport of chemical reactants in the gas-chamber. The contribution are an optimal control problem based on a PID control to obtain a homogeneous layering. We have taken into account one- and two-dimensional problems that are given with constraints and control functions. A finite-element formulation with adaptive feedback control for time-step selection has been developed for the diffusion process. The optimization is presented with efficient algorithms. Numerical experiments are discussed with respect to the diffusion processes of the macroscopic model.