Dielectric and Structural Properties of Poly(vinylidene fluoride) (PVDF) and Poly(vinylidene fluoride-trifluoroethylene) (PVDF-TrFE) Filled with Magnesium Oxide Nanofillers

Author:

Arshad A. N.1ORCID,Wahid M. H. M.1ORCID,Rusop M.2ORCID,Majid W. H. A.3,Subban R. H. Y.1,Rozana M. D.1ORCID

Affiliation:

1. Faculty of Applied Sciences, Universiti Teknologi MARA (UiTM), 40450 Shah Alam, Selangor, Malaysia

2. NANO-SciTech Centre (NST), Institute of Science (IOS), Universiti Teknologi MARA (UiTM), 40450 Shah Alam, Selangor, Malaysia

3. Low Dimensional Research Centre, Faculty of Science, Universiti Malaya, 50603 Kuala Lumpur, Malaysia

Abstract

This study examines the dielectric properties of filled PVDF film and filled PVDF-TrFE film incorporated with 1, 3, 5, and 7 weight percentages of magnesium oxide (MgO) nanofillers. The metal-insulator-metal (MIM) configuration demonstrates PVDF/MgO with 7 weight percent of MgO which produced high dielectric constant (1 kHz) with low dielectric loss. The ATR-FTIR spectra of PVDF/MgO (7%) indicate wide bonding peaks at 840 cm-1 and 880 cm-1, assigned to -CH2 and -CF2 groups, respectively. This implies the presence of high content of β-crystals in the PVDF/MgO (7%) film. A shift in the peak was observed in the same film, from 1170 cm-1 to 1180 cm-1 suggesting possible transformation from γ-crystals to β-crystals. This film showed no apparent defect on its film surface. Thus, it established that PVDF incorporated with 7% MgO can be used to produce nanocomposite thin film for low-frequency electronic devices.

Funder

Universiti Teknologi MARA

Publisher

Hindawi Limited

Subject

General Materials Science

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