Multiphoton Dissociation of Phenylsilane Upon Excitation at 212.5 NM

Author:

Oujja Mohamed1,Martín Margarita1,De Nalda Rebeca1,Castillejo Marta1

Affiliation:

1. Instituto de Química Física “Rocasolano”, CSIC, Serrano 119, Madrid 28006, Spain

Abstract

The photodissociation processes that follow the photolysis of phenylsilane with a narrow band laser at 212.5 nm were studied by observing photofragment fluorescence spectra in the 200 to 900 nm range. Emission from several excited states of Si atoms was detected together with emissions from the molecular fragments SiH(A2∆) and C2(d3g). Si and SiH emissions show a quadratic dependence with laser energy whereas dependence for C2 emission is cubic, indicating the participation of two and three photon processes in the formation of the respective fragments. The emission spectra of the molecular fragments provides information about their internal energy content and allows discussion of the possible channels responsible for the appearance of those fragments.

Publisher

Hindawi Limited

Subject

Spectroscopy,Biochemistry,Atomic and Molecular Physics, and Optics

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Near UV multiphoton dissociation of organosilanes with picosecond and nanosecond laser pulses;Journal of Photochemistry and Photobiology A: Chemistry;2000-05

2. Photodissociation of H2O and D2O below 132 nm;The Journal of Chemical Physics;2000-04

3. Gas-phase infrared laser photolysis of phenylsilane;Journal of Photochemistry and Photobiology A: Chemistry;2000-02

4. UV laser multiphoton ionization—dissociation of phenylsilane and its homogeneous dimers;International Journal of Mass Spectrometry and Ion Processes;1998-01

5. IR and UV laser-induced photolysis of 2-chloroethenylsilane;Journal of Photochemistry and Photobiology A: Chemistry;1997-10

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