Experimental Investigation on Mechanical Properties of TiAlN Thin Films Deposited by RF Magnetron Sputtering-Reference-Cited by-同舟云学术

Experimental Investigation on Mechanical Properties of TiAlN Thin Films Deposited by RF Magnetron Sputtering

Published:2021-11-01 Issue: Volume:2021 Page:1-7
ISSN:1687-4129
Container-title:Journal of Nanomaterials
language:en
Short-container-title:Journal of Nanomaterials

Author:

Natrayan L.¹^ORCID,Balaji S.²,Bharathiraja G.¹,Kaliappan S.³^ORCID,Veeman Dhinakaran⁴,Mammo Wubishet Degife⁵^ORCID

Affiliation:

1. Department of Mechanical Engineering, Saveetha School of Engineering, SIMATS, Chennai, Tamil Nadu 602105, India

2. Department of Mechanical Engineering, SRM Institute of Science and Technology, 603203, Chennai, India

3. Department of Mechanical Engineering, Velammal Institute of Technology, Tamil Nadu, 601204, Chennai, India

4. Centre for Additive Manufacturing, Chennai Institute of Technology, 600069, Chennai, India

5. Mechanical Engineering Department, Wollo University, Kombolcha Institute of Technology, Kombolcha, South Wollo-, 208 Amhara, Ethiopia

Abstract

The mechanical properties of TiAlN deposited on the steel are explained in this study. Thin films are deposited by RF magnetron sputtering on the steel substrates to improve the wear resistance and hardness of the samples. Due to their improved microstructure and nanograins, the nanofilms have improved the mechanical properties of the steel substrate surface. The thin film deposited has improved the wear resistance by 80% and has improved the hardness by 95%. The deposited thin films are tested for hardness by nanoindentation and wear test by the pin-on-disk test. SEM has tested films for their microstructure and adhesion by nanoscratch test.

Publisher

Hindawi Limited

Subject

General Materials Science

Link

http://downloads.hindawi.com/journals/jnm/2021/5943486.pdf

Reference36 articles.

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