Gas Nozzle Effect on the Deposition of Polysilicon by Monosilane Siemens Reactor

Author:

Kang Seung Oh1,Lee Uk June1,Kim Seung Hyun1,You Ho Jung1,Park Kun1,Park Sung Eun1,Park Jong Hoon1

Affiliation:

1. Technical R&D Center, Semi-Materials Co., Ltd., Youngcheon, Gyeongbuk 770-803, Republic of Korea

Abstract

Deposition of polysilicon (poly-Si) was tried to increase productivity of poly-Si by using two different types of gas nozzle in a monosilane Bell-jar Siemens (MS-Siemens) reactor. In a mass production of poly-Si, deposition rate and energy consumption are very important factors because they are main performance indicators of Siemens reactor and they are directly related with the production cost of poly-Si. Type A and B nozzles were used for investigating gas nozzle effect on the deposition of poly-Si in a MS-Siemens reactor. Nozzle design was analyzed by computation cluid dynamics (CFD). Deposition rate and energy consumption of poly-Si were increased when the type B nozzle was used. The highest deposition rate was 1 mm/h, and the lowest energy consumption was72 kWhkg-1in this study.

Funder

Ministry of Knowledge Economy

Publisher

Hindawi Limited

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,Atomic and Molecular Physics, and Optics,General Chemistry

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