Noise Parameter Analysis of SiGe HBTs for Different Sizes in the Breakdown Region
Author:
Affiliation:
1. Department of Electrical Engineering, National Sun Yat-sen University, No. 70 Lienhai Rd., Kaohsiung 80424, Taiwan
2. Institute of Communications Engineering, National Sun Yat-sen University, No. 70 Lienhai Rd., Kaohsiung 80424, Taiwan
Abstract
Funder
Wireless Communication Antenna Research Center
Publisher
Hindawi Limited
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://downloads.hindawi.com/journals/apec/2016/8506507.pdf
Reference18 articles.
1. A Low-Power Ultrawideband Low-Noise Amplifier in 0.18 μm CMOS Technology
2. Small-Signal and Noise Model Determination for Double Polysilicon Self-Aligned Bipolar Transistors
3. Effects of Spacer Thickness on Noise Performance of Bipolar Transistors
4. The effects of geometrical scaling on the frequency response and noise performance of SiGe HBTs
5. Design of an oscillator with low phase noise and medium output power in a 0.25 µm GaN‐on‐SiC high electron‐mobility transistors technology
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