Impact of Substrate Outgassing on the Growth of Carbon Nanotubes Using the Single-Pulse Discharge Method

Abstract

Carbon nanotubes (CNTs) were fabricated in air using the electrical discharge machining method. The main parameters for this process were substrate temperature, peak current (Ip), and pulse duration (τ). The substrate was baked at 50°C and this temperature was maintained for 12 h under vacuum chamber; it was then cooled to room temperature and stored in vacuum for outgassing. During single-pulse discharge in air, the substrate was heated from room temperature to the test temperatures (50 and 70°C). The results indicated that the length, density, and purity of CNTs grown on outgassed substrates were better than those of CNTs grown without outgassing. Additionally, CNTs grown withIp= 3 A andτ= 1200 μs were of better quality than those grown with other combinations of parameters. The size of the discharge pit was effectively reduced by 30% (80 μm). This finding may help in controlling the amount of peak current used during the process, thereby reducing the problems of heat-affected zones and electrode consumption. Consequently, there was substantial improvement in the zonal selectivity and reticular density of the CNTs grown using the single-pulse discharge method.