Collimated Magnetron Sputter Deposition for Mirror Coatings-Reference-Cited by-同舟云学术

Collimated Magnetron Sputter Deposition for Mirror Coatings

Published:2008-06-15 Issue: Volume:2008 Page:1-9
ISSN:1687-7632
Container-title:X-Ray Optics and Instrumentation
language:en
Short-container-title:X-Ray Optics and Instrumentation

Author:

Vickery Anette¹^ORCID,Jensen Carsten P.²,Christensen Finn E.²,Steenstrup Mads Peter³,Schønfeldt Troels³

Affiliation:

1. Nano-Science Center, University of Copenhagen, The H. C. Ørsted Institute, Universitetsparken 5, 2100 Copenhagen, Denmark

2. Danish National Space Center, Juliane Maries Vej 30, 2100 Copenhagen, Denmark

3. Niels Bohr Institute, University of Copenhagen, The H. C. Ørsted Institute, Universitetsparken 5, 2100 Copenhagen, Denmark

Abstract

At the Danish National Space Center (DNSC), a planar magnetron sputtering chamber has been established as a research and production coating facility for curved X-ray mirrors for hard X-ray optics for astronomical X-ray telescopes. In the following, we present experimental evidence that a collimation of the sputtered particles is an efficient way to suppress the interfacial roughness of the produced multilayer. We present two different types of collimation optimized for the production of low roughness curved mirrors and flat mirrors, respectively.

Publisher

Hindawi Limited

Subject

Instrumentation,Atomic and Molecular Physics, and Optics

Link

http://downloads.hindawi.com/archive/2008/792540.pdf

Reference3 articles.

1. Collimated magnetron sputter deposition

2. Microstructure of thin tantalum films sputtered onto inclined substrates: Experiments and atomistic simulations

3. A sputtering technique for coating the inside walls of through-holes in substrates

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