Corrigendum #2 to “Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells”-Reference-Cited by-同舟云学术

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Corrigendum #2 to “Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells”

Published:2020-09-12 Issue: Volume:2020 Page:1-1
ISSN:1110-662X
Container-title:International Journal of Photoenergy
language:en
Short-container-title:International Journal of Photoenergy

Author:

Sharma K.¹^ORCID,Williams B. L.¹^ORCID,Mittal A.¹,Knoops H. C. M.¹^ORCID,Kniknie B. J.²³,Bakker N. J.³⁴,Kessels W. M. M.¹³^ORCID,Schropp R. E. I.¹³⁴,Creatore M.¹³^ORCID

Affiliation:

1. Department of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, Netherlands

2. TNO, P.O. Box 6235, 5600 HE Eindhoven, Netherlands

3. Solliance, High Tech Campus 21, 5656 AE Eindhoven, Netherlands

4. ECN, High Tech Campus 21, 5656 AE Eindhoven, Netherlands

Publisher

Hindawi Limited

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,Atomic and Molecular Physics, and Optics,General Chemistry

Link

http://downloads.hindawi.com/journals/ijp/2020/1215032.pdf

Reference2 articles.

1. Expanding Thermal Plasma Chemical Vapour Deposition of ZnO:Al Layers for CIGS Solar Cells

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