Electrodeposition and Characterization of CuTe and Cu2Te Thin Films-Reference-Cited by-同舟云学术

Electrodeposition and Characterization of CuTe and Cu2Te Thin Films

Published:2015 Issue: Volume:2015 Page:1-5
ISSN:1687-4110
Container-title:Journal of Nanomaterials
language:en
Short-container-title:Journal of Nanomaterials

Author:

He Wenya¹²,Zhang Hanzhi²,Zhang Ye²,Liu Mengdi²,Zhang Xin¹²,Yang Fengchun²

Affiliation:

1. Shaanxi Provincial Key Laboratory of Electroanalytical Chemistry, Institute of Analytical Science, Northwest University, Xi’an, Shaanxi 710069, China

2. Key Laboratory of Synthetic and Natural Functional Molecule Chemistry of Ministry of Education, College of Chemistry and Materials Science, Northwest University, Xi’an, Shaanxi 710127, China

Abstract

An electrodeposition method for fabrication of CuTe and Cu2Te thin films is presented. The films’ growth is based on the epitaxial electrodeposition of Cu and Te alternately with different electrochemical parameter, respectively. The deposited thin films were characterized by X-ray diffraction (XRD), field emission scanning electronic microscopy (FE-SEM) with an energy dispersive X-ray (EDX) analyzer, and FTIR studies. The results suggest that the epitaxial electrodeposition is an ideal method for deposition of compound semiconductor films for photoelectric applications.

Funder

National Natural Science Foundation of China

Publisher

Hindawi Limited

Subject

General Materials Science

Link

http://downloads.hindawi.com/journals/jnm/2015/240525.pdf

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