Thickness Measurement of V2O5Nanometric Thin Films Using a Portable XRF

Abstract

Nanometric thin films have always been chiefly used for decoration; however they are now being widely used as the basis of high technology. Among the various physical qualities that characterize them, the thickness strongly influences their properties. Thus, a new procedure is hereby proposed and developed for determining the thickness of V2O5nanometric thin films deposited on the glass surface using Portable X-Ray Fluorescence (PXRF) equipment and the attenuation of the radiation intensity Kαof calcium present in the glass. It is shown through the present paper that the radiation intensity of calcium Kαrays is proportional to film thickness in nanometric films of vanadium deposited on the glass surface.