Magnetic Domain Patterns in Bilayered Ribbons Studied by Magnetic Force Microscopy and Magneto-Optical Kerr Microscopy

Author:

Trojková Jana1,Životský Ondřej12ORCID,Hendrych Aleš13,Markov Dmitry1,Drobíková Klára45

Affiliation:

1. Department of Physics, VŠB-Technical University of Ostrava, 17 Listopadu 15/2172, Poruba, 708 33 Ostrava, Czech Republic

2. Boris Yeltsin Ural Federal University, Ekaterinburg 620002, Russia

3. Varroc Lighting Systems, s.r.o., Suvorovova 195, 742 42 Šenov u Nového Jičína, Czech Republic

4. IT4Innovations Centre of Excellence, VŠB-Technical University of Ostrava, 17 Listopadu 15/2172, Poruba, 708 33 Ostrava, Czech Republic

5. Nanotechnology Centre, VŠB-Technical University of Ostrava, 17 Listopadu 15/2172, Poruba, 708 33 Ostrava, Czech Republic

Abstract

The magnetic domain patterns of amorphous bilayered FeSiB/FeNbSiB and FeNbCuSiB/CoSiB ribbons are observed and analysed using the magneto-optical Kerr microscopy (MOKM) and magnetic force microscopy (MFM). Both microscopic techniques are highly sensitive to the sample surface; possibility of Kerr microscopy to visualize the domains separately in both layers is achieved by focusing the laser spot on the ribbon cross section. Wide curved domains as well as fine fingerprint domains were detected at the surface of ribbons due to presence of local stresses coming from the preparation process. With respect to high lateral resolution of MFM and its out-of-plane magnetization sensitivity, the perpendicularly magnetized crossed stripe domain patterns can be selected as well. Coiling of the ribbons on the half-round-end sample holder is often used to induce and control the magnetic anisotropy of these alloys. Changes in the magnetic domain structure at the outer-coiled surface and its dependence on the sign of magnetostriction coefficient are discussed in detail. Finally, the MFM images in the presence of external in-plane magnetic field up to ±40 kA/m are shown.

Funder

IT4Innovations Excellence in Science

Publisher

Hindawi Limited

Subject

Instrumentation,Atomic and Molecular Physics, and Optics

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