Influence of Deposition Condition on Y2O3Coatings Produced by Pulsed Electrophoretic Deposition

Abstract

Y2O3nanoparticle suspension aqueous solution was prepared using citric acid. Then, Y2O3film was deposited using this solution with pulsed electrophoretic deposition (EPD). A dense Y2O3film of 25.7 μm thickness was obtained with deposition conditions of 0.5 wt% Y2O3concentration, bias voltage of 0.5 V, and bias frequency of 1 kHz. The respective resistivities of the as-deposited film and films heat-treated at 200°C and 400°C were 2.84 × 103 Ω·cm, 5.36 × 104 Ω·cm, and 2.05 × 106 Ω·cm. A 59.8 μm thick dense Y2O3film was obtained using two-step deposition with change of the bias voltage: a first step of 0.5 V and a second step of 2.0 V.