Hot Carriers in CVD-Grown Graphene Device with a Top h-BN Layer

Author:

Chuang C.12ORCID,Mineharu M.1,Matsumoto N.1,Matsunaga M.1,Liu C.-W.3,Wu B.-Y.3,Kim Gil-Ho4,Lin L.-H.5,Ochiai Y.1,Watanabe K.6,Taniguchi T.6,Liang C.-T.3ORCID,Aoki N.1ORCID

Affiliation:

1. Department of Materials Science, Chiba University, Chiba 263-8522, Japan

2. Institute of Atomic and Molecular Sciences, Academia Sinica, Taipei 10617, Taiwan

3. Graduate Institute of Applied Physics, National Taiwan University, Taipei 10617, Taiwan

4. School of Electronic and Electrical Engineering, Sungkyunkwan University, Suwon 16419, Republic of Korea

5. Department of Electrophysics, National Chiayi University, Chiayi 600, Taiwan

6. Advanced Materials Laboratory, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan

Abstract

We investigate the energy relaxation of hot carriers in a CVD-grown graphene device with a top h-BN layer by driving the devices into the nonequilibrium regime. By using the magnetic field dependent conductance fluctuations of our graphene device as a self-thermometer, we can determine the effective carrier temperature Te at various driving currents I while keeping the lattice temperature TL fixed. Interestingly, it is found that Te is proportional to I, indicating little electron-phonon scattering in our device. Furthermore the average rate of energy loss per carrier Pe is proportional to (Te2-TL2), suggesting the heat diffusion rather than acoustic phonon processes in our system. The long energy relaxation times due to the weak electron-phonon coupling in CVD graphene capped with h-BN layer as well as in exfoliated multilayer graphene can find applications in hot carrier graphene-based devices.

Funder

Academia Sinica

Publisher

Hindawi Limited

Subject

General Materials Science

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