Study on UV/O<SUB>3</SUB> Cleaning by Xe<SUB>2</SUB>*Excimer Lamp-Reference-Cited by-同舟云学术

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Study on UV/O₃ Cleaning by Xe₂*Excimer Lamp

Published:1999 Issue:5 Volume:83 Page:273-277
ISSN:0019-2341
Container-title:JOURNAL OF THE ILLUMINATING ENGINEERING INSTITUTE OF JAPAN
language:en
Short-container-title:Journal of the Illuminating Engineering Institute of Japan

Author:

Iso Shinichi¹,Igarashi Tatsushi²,Matsuno Hiromitsu¹

Affiliation:

1. USHIO INC.

2. USHIO Research Institute of Technology Inc.

Publisher

Illuminating Engineering Society of Japan

Subject

Electrical and Electronic Engineering

Link

https://www.jstage.jst.go.jp/article/jieij1980/83/5/83_5_273/_pdf

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optimization of gas-flow condition for a real scale semiconductor packaging process using the Photodesmear® method;Japanese Journal of Applied Physics;2022-07-25

2. Full-Sized Panel Photodesmear for Via Residue Cleaning;2016 IEEE 66th Electronic Components and Technology Conference (ECTC);2016-05

3. Understanding TiO2 Photocatalysis: Mechanisms and Materials;Chemical Reviews;2014-09-19

4. Evaluation of Vacuum Ultraviolet Irradiation Influence under Xenon Excimer Lamp Processing Employing a Quartz Crystal Microbalance with Organic Thin Film;Japanese Journal of Applied Physics;2013-05-01

5. Resist Removal Method using Xe2 Excimer Ultraviolet Light;Journal of Photopolymer Science and Technology;2011

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