Nitrogen doping of amorphous DLC films by rf plasma dissociated nitrogen atom surface bombardment in a vacuum-Reference-Cited by-同舟云学术

Nitrogen doping of amorphous DLC films by rf plasma dissociated nitrogen atom surface bombardment in a vacuum

Published:2000-10 Issue:5 Volume:16 Page:427-430
ISSN:0267-0844
Container-title:Surface Engineering
language:en
Short-container-title:Surface Engineering

Author:

Ogwu A.A.¹,Magill D.¹,Maguire P.¹,McLaughlin J.¹,McCullough R.W.²,Voulot D.²

Affiliation:

1. The Northern Ireland Bio-Engineering Centre (NIBEC), School of Electrical and Mechanical Engineering, University of Ulster at Jordanstown, Co. Antrim, BT37 OQB, Northern Ireland, UK

2. The Department of Pure and Applied PhysicsThe Queens University of Belfast, Belfast, UK

Publisher

Informa UK Limited

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://www.tandfonline.com/doi/pdf/10.1179/026708400101517422

Reference15 articles.

1. Synthesis and processing of superhard carbon nitride solids

2. Field emission from nitrogen doped tetrahedral amorphous carbon prepared by filtered cathodic vacuum arc technique

3. Incorporation of nitrogen into diamond-like carbon films

4. Nitrogen Doping of Amorphous Carbon Surfaces

5. Carbon nitride deposited using energetic species: A review on XPS studies

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