Effect of annealing temperature on microstructure and thermoelectric properties of bismuth–telluride multilayer thin films prepared by magnetron sputtering-Reference-Cited by-同舟云学术

Effect of annealing temperature on microstructure and thermoelectric properties of bismuth–telluride multilayer thin films prepared by magnetron sputtering

Published:2015-12-14 Issue:sup10 Volume:19 Page:S10-408-S10-412
ISSN:1432-8917
Container-title:Materials Research Innovations
language:en
Short-container-title:Materials Research Innovations

Author:

Zhang J. X.¹²,Li Q.¹³,Niu P. J.¹²,Yang Q. X.¹²,Tan B. M.³,Niu X. H.³,Gao B. H.³

Affiliation:

1. Tianjin Key Laboratory of Advanced Electrical Engineering and Energy TechnologySchool of Electrical Engineering and Automation, Tianjin Polytechnic University, Tianjin 300387, China

2. State Key Laboratory of Hollow Fiber Membrane Materials and ProcessesTianjin Polytechnic University, Tianjin 300387, China

3. Institute of Microelectronics, Hebei University of Technology, Tianjin 300131, China

Publisher

Informa UK Limited

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://www.tandfonline.com/doi/pdf/10.1179/1432891715Z.0000000002209

Reference28 articles.

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5. Experimental study of the effect of quantum-well structures on the thermoelectric figure of merit

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