Deposition process, microstructure and mechanical behaviours of RF magnetron sputtered (Ti,Al)N thin films-Reference-Cited by-同舟云学术

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Deposition process, microstructure and mechanical behaviours of RF magnetron sputtered (Ti,Al)N thin films

Published:2008-11 Issue:11 Volume:24 Page:1299-1303
ISSN:0267-0836
Container-title:Materials Science and Technology
language:en
Short-container-title:Materials Science and Technology

Author:

Yang H. S.,Lu Y. H.,He X.,Xiong X. T.,Qiao L. J.,Wang Y. B.

Publisher

Informa UK Limited

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

http://www.tandfonline.com/doi/pdf/10.1179/174328407X158659

Reference13 articles.

1. Electron microscopy analysis of the microstructure of Ti1−xAlxN alloy thin films prepared using a chemical vapour deposition method

2. Composition, binding states, structure, and morphology of the corrosion layer of an oxidized Ti0.46Al0.54N film

3. Study on d.c. magnetron sputter deposition of titanium aluminium nitride thin films: effect of aluminium content on coating

4. Structural and mechanical properties of titanium–aluminium–nitride films deposited by reactive close-field unbalanced magnetron sputtering

5. Effect of aluminum concentration on friction and wear properties of titanium aluminum nitride films

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical properties and microstructure of TiN thin films before and after annealing;Materials Express;2019-02-01

2. Mechanical properties and adhesion of TiN monolayer and TiN/TiAlN nanolayer coatings;Journal of Adhesion Science and Technology;2013-09-09

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