Comparison of microstructure and electronic properties of TiO2 thin films grown by different techniques-Reference-Cited by-同舟云学术

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Comparison of microstructure and electronic properties of TiO2 thin films grown by different techniques

Published:2011-06 Issue:5 Volume:27 Page:350-354
ISSN:0267-0844
Container-title:Surface Engineering
language:en
Short-container-title:Surface Engineering

Author:

Prasad A K¹,Jha R²,Ramaseshan R¹,Dash S¹,Manna I³,Tyagi A K¹

Affiliation:

1. Surface and Nanoscience DivisionMaterials Science Group, Indira Gandhi Centre for Atomic Research, Kalpakkam, Tamil Nadu 603102, India

2. Department of PhysicsMANIT, Bhopal, Madhya Pradesh 462003, India

3. Department of Metallurgical and Materials EngineeringIndian Institute of Technology Kharagpur, Kharagpur, West Bengal 721302, India

Publisher

Informa UK Limited

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://www.tandfonline.com/doi/pdf/10.1179/026708410X12683118611266

Reference23 articles.

1. Structural and electrical properties of TiO2 RF sputtered thin films

2. Sensing behavior of TiO2 thin films exposed to air at low temperatures

3. Spectroscopic ellipsometry of TiO2 layers prepared by ion-assisted electron-beam evaporation

4. Anatase phase TiO2 thin films obtained by pulsed laser deposition for gas sensing applications

5. Phase transformation in room temperature pulsed laser deposited TiO2 thin films

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3. Ag antidot array modified TiO2 film and its photocatalysis performance;Acta Physica Sinica;2012

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