Research progress of additives for electroplating copper in high-end electronic manufacturing

Author:

Zheng Chaojie,Zhang Tao,Li Haidi,Song Shiqi,Shen Xixun,Li Qiaoxia,He Wei,Chen Yuanming,Jiang Yanxia,Huang Rui,Xu Qunjie

Publisher

Science China Press., Co. Ltd.

Subject

Materials Chemistry,General Chemical Engineering,Biochemistry,General Chemistry

Reference61 articles.

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2. Copper electroplating of PCB interconnects using megasonic acoustic streaming

3. Ji LX. Investigation of copper electrodeposition for printed-circuit interconnection based no multiphysics coupling method. Doctor Dissertation. Chengdu: University of Electronic Science and Technology of China, 2016 (in Chinese) [冀林仙. 基于多物理场耦合的印制电路电镀铜互连研究. 成都:电子科技大学, 2016].

4. Jin L, Yang JQ, Yang FZ, Zhan DP, Tian ZQ, Zhou SM. J Electrochem, 2020, 26: 521–530 (in Chinese) [金磊, 杨家强, 杨防祖, 詹东平, 田中群, 周绍民. 电化学, 2020, 26: 521–530].

5. Recent Advances in Electroplating of Through-Hole Copper Interconnection

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