LEO: Line End Optimizer for Sub-7nm Technology Nodes-Reference-Cited by-同舟云学术

LEO: Line End Optimizer for Sub-7nm Technology Nodes

Published:2022-04-13 Issue: Volume: Page:
ISSN:
Container-title:Proceedings of the 2022 International Symposium on Physical Design
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Author:

Pandey Diwesh¹,Tellez Gustavo E.²,Leland James³

Affiliation:

1. IBM Systems, Bengaluru, India

2. IBM T.J. Watson Research Center, Yorktown Heights, NY, USA

3. IBM Systems, Poughkeepsie, NY, USA

Publisher

ACM

Link

https://dl.acm.org/doi/pdf/10.1145/3505170.3506726

Reference10 articles.

1. L. Liebmann , L. Pileggi , J. Hibbeler , V. Rovner , T. Jhaveri , and G. Northrop , " Simplify to survive: prescriptive layouts ensure profitable scaling to 32nm and beyond," in Design for Manufacturability through Design-Process Integration III , vol. 7275 , p. 72750A, International Society for Optics and Photonics , 2009 . L. Liebmann, L. Pileggi, J. Hibbeler, V. Rovner, T. Jhaveri, and G. Northrop, "Simplify to survive: prescriptive layouts ensure profitable scaling to 32nm and beyond," in Design for Manufacturability through Design-Process Integration III, vol. 7275, p. 72750A, International Society for Optics and Photonics, 2009.

2. H. Zhang , Y. Du , M. D. Wong , and K.-Y. Chao , "Mask cost reduction with circuit performance consideration for self-aligned double patterning," in Design Automation Conference (ASP-DAC) , 2011 16th Asia and South Pacific , pp. 787 -- 792 , IEEE, 2011 . H. Zhang, Y. Du, M. D. Wong, and K.-Y. Chao, "Mask cost reduction with circuit performance consideration for self-aligned double patterning," in Design Automation Conference (ASP-DAC), 2011 16th Asia and South Pacific, pp. 787--792, IEEE, 2011.

3. H. Zhang , Y. Du , M. D. Wong , and R. Topaloglu , " Self-aligned double patterning decomposition for overlay minimization and hot spot detection," in Proceedings of the 48th Design Automation Conference , pp. 71 -- 76 , IEEE , 2011 . H. Zhang, Y. Du, M. D. Wong, and R. Topaloglu, "Self-aligned double patterning decomposition for overlay minimization and hot spot detection," in Proceedings of the 48th Design Automation Conference, pp. 71--76, IEEE, 2011.

4. Y. Ban , K. Lucas , and D. Pan , " Flexible 2d layout decomposition framework for spacer-type double pattering lithography," in Proceedings of the 48th Design Automation Conference, pp. 789--794 , ACM , 2011 . Y. Ban, K. Lucas, and D. Pan, "Flexible 2d layout decomposition framework for spacer-type double pattering lithography," in Proceedings of the 48th Design Automation Conference, pp. 789--794, ACM, 2011.

5. Z. Xiao Y. Du H. Zhang and M. D.Wong "A polynomial time exact algorithm for self-aligned double patterning layout decomposition " in Proceedings of the 2012 ACM international symposium on International Symposium on Physical Design pp. 17--24 ACM 2012. Z. Xiao Y. Du H. Zhang and M. D.Wong "A polynomial time exact algorithm for self-aligned double patterning layout decomposition " in Proceedings of the 2012 ACM international symposium on International Symposium on Physical Design pp. 17--24 ACM 2012.