Multiple patterning layout decomposition considering complex coloring rules-Reference-Cited by-同舟云学术

Multiple patterning layout decomposition considering complex coloring rules

Published:2016-06-05 Issue: Volume: Page:
ISSN:
Container-title:Proceedings of the 53rd Annual Design Automation Conference
language:
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Author:

Chang Hua-Yu¹,Jiang Iris Hui-Ru²

Affiliation:

1. Synopsys, Inc., Hsinchu, Taiwan

2. National Chiao Tung University, Hsinchu, Taiwan

Publisher

ACM

Link

https://dl.acm.org/doi/pdf/10.1145/2897937.2898048

Reference16 articles.

1. ITRS lithography roadmap: 2015 challenges;Neisser M.;Adv. Opt. Techn.,2015

2. J. Dorsch "Changes and challenges abound in multi-patterning lithography " Semiconductor Manufacturing & Design Feb. 2015. J. Dorsch "Changes and challenges abound in multi-patterning lithography " Semiconductor Manufacturing & Design Feb. 2015.

3. Layout Decomposition Approaches for Double Patterning Lithography

4. Optimal layout decomposition for double patterning technology;Tang X.;ICCAD,2011

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