Wafer-Level Characteristic Variation Modeling Considering Systematic Discontinuous Effects

Author:

Nagao Takuma1,Nakamura Tomoki2,Kajiyama Masuo2,Eiki Makoto2,Inoue Michiko1,Shintani Michihiro3

Affiliation:

1. Nara Institute of Science and Technology, Ikoma, Japan

2. Sony Semiconductor Manufacturing Corporation, Isahaya, Japan

3. Kyoto Institute of Technology, Kyoto, Japan

Funder

JSPS KAKENHI Grant

Publisher

ACM

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Challenges for Predictive Quality in Multi-stage Manufacturing: Insights from Literature Review;Proceedings of the 3rd International Workshop on Software Engineering and AI for Data Quality in Cyber-Physical Systems/Internet of Things;2023-12-04

2. Efficient Wafer-level Spatial Variation Modeling for Multi-site RF IC Testing;IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences;2023

3. Wafer-Level Characteristic Variation Modeling Considering Systematic Discontinuous Effects;IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences;2023

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