Impact of Fin Width Scaling on RF/Analog Performance of Junctionless Accumulation-Mode Bulk FinFET
Author:
Affiliation:
1. MCKV Institute of Engineering, Liluah, WB, India
2. Kalyani Government Engineering College, Kalyani, WB, India
3. Jadavpur University, Kolkata, WB, India
Abstract
Publisher
Association for Computing Machinery (ACM)
Subject
Electrical and Electronic Engineering,Hardware and Architecture,Software
Link
https://dl.acm.org/doi/pdf/10.1145/2903143
Reference38 articles.
1. Fin shape fluctuations in FinFET: Correlation to electrical variability and impact on 6-T SRAM noise margins
2. A Dual-Material Gate Junctionless Transistor With High-$k$ Spacer for Enhanced Analog Performance
3. Implications of fin width scaling on variability and reliability of high-k metal gate FinFETs
4. Analysis and control of floating-body bipolar effects in fully depleted submicrometer SOI MOSFET's
5. Origin of Device Performance Enhancement of Junctionless Accumulation-Mode (JAM) Bulk FinFETs With High-$\kappa $ Gate Spacers
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