Timing yield-aware color reassignment and detailed placement perturbation for double patterning lithography-Reference-Cited by-同舟云学术

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Timing yield-aware color reassignment and detailed placement perturbation for double patterning lithography

Published:2009 Issue: Volume: Page:
ISSN:
Container-title:Proceedings of the 2009 International Conference on Computer-Aided Design - ICCAD '09
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Author:

Gupta Mohit,Jeong Kwangok,Kahng Andrew B.

Publisher

ACM Press

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Machine Learning for Mask Synthesis and Verification;Machine Learning Applications in Electronic Design Automation;2022

2. Pushing multiple patterning in sub-10nm;Proceedings of the 52nd Annual Design Automation Conference;2015-06-07

3. Bridging the gap from mask to physical design for multiple patterning lithography;SPIE Proceedings;2014-03-28

4. Single-Mask Double-Patterning Lithography for Reduced Cost and Improved Overlay Control;IEEE Transactions on Semiconductor Manufacturing;2011-02

5. Within-Layer Overlay Impact for Design in Metal Double Patterning;IEEE Transactions on Semiconductor Manufacturing;2010-08

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