Effective model-based mask fracturing for mask cost reduction-Reference-Cited by-同舟云学术

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Effective model-based mask fracturing for mask cost reduction

Published:2015-06-07 Issue: Volume: Page:
ISSN:
Container-title:Proceedings of the 52nd Annual Design Automation Conference
language:
Short-container-title:

Author:

Kagalwalla Abde Ali¹,Gupta Puneet¹

Affiliation:

1. University of California, Los Angeles

Funder

IMPACT center

Publisher

ACM

Link

https://dl.acm.org/doi/pdf/10.1145/2744769.2744828

Reference29 articles.

1. "International Technology Roadmap for Semiconductors(ITRS) " http://www.itrs.net/ 2009. "International Technology Roadmap for Semiconductors(ITRS) " http://www.itrs.net/ 2009.

2. M. Malloy "2013 mask industry survey " http://public.sematech.org/SEMATECH%20Publications/PDAR242_bpm.pdf 2013. M. Malloy "2013 mask industry survey " http://public.sematech.org/SEMATECH%20Publications/PDAR242_bpm.pdf 2013.

3. PMJ panel discussion overview on mask complexities, cost, and cycle time in 32-nm system LSI generation: conflict or concurrent?

4. Efficient Algorithms for Geometric Graph Search Problems

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