TEMPO: Fast Mask Topography Effect Modeling with Deep Learning
Author:
Affiliation:
1. University of Texas at Austin, Austin, TX, USA
2. Kioxia Corporation, Yokohama, Japan
3. Peking University, Beijing, China
Publisher
ACM
Link
https://dl.acm.org/doi/pdf/10.1145/3372780.3375565
Reference30 articles.
1. Mask topography effects in projection printing of phase-shifting masks
2. Mask topography simulation for EUV lithography
3. Impact of mask topography and multilayer stack on high NA imaging of EUV masks;Ruoff J.;Photomask Technology,2010
4. Understanding focus effects in submicrometer optical lithography: a review
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