1. Optimization of sub-100-nm designs for mask cost reduction;Balasinski A.;Journal of Microlithography, Microfabrication, and Microsystems,2004
2. The Critical Role of Design in Nanometer Process Yield;Levitt M.;Nanochip Technology Journal, Issue,2006
3. Layout impact of resolution enhancement techniques
4. Heavy rules hold back 90-nm yield -- Pressure mounts to supplant rules-based tradition with inflow design-for-yield based on process models;Wilson R.;Electronic Engineering Times, Issue,2005