Post-Layout Optimization for Field-coupled Nanotechnologies
Author:
Affiliation:
1. Chair for Design Automation, Technical University of Munich, Germany
2. Chair for Design Automation, Technical University of Munich, Germany and Software Competence Center Hagenberg (SCCH), Austria
Publisher
ACM
Link
https://dl.acm.org/doi/pdf/10.1145/3611315.3633247
Reference37 articles.
1. R. Achal 2018. Lithography for robust and editable atomic-scale silicon devices and memories. Nat. Commun. 9, 1 (2018).
2. F. Altincicek. 2022. Atomically Defined Wires on P-Type Silicon. Bull. Am. Phys. Soc. (2022).
3. N.G. Anderson and S. Bhanja (Eds.). 2014. Field-Coupled Nanocomputing - Paradigms Progress and Perspectives. Springer.
4. On Global Electricity Usage of Communication Technology: Trends to 2030
5. V. Bertacco 2005. Post-Placement Rewiring and Rebuffering by Exhaustive Search for Functional Symmetries. In ICCAD. 56–63.
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