SF 6 Plasma Etching of Silicon: Evidence of Sequential Multilayer Fluorine Adsorption
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy
Link
https://iopscience.iop.org/article/10.1209/0295-5075/4/9/016/pdf
Cited by 26 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Two-Step Plasma-Texturing Process for Multicrystalline Silicon Solar Cells With Linear Microwave Plasma Sources;IEEE Journal of Photovoltaics;2013-01
2. Study of SF6/N2O Microwave Plasma for Surface Texturing of Multicrystalline (150 mu m) Solar Substrates;Japanese Journal of Applied Physics;2012-10-22
3. Study of SF6/N2O Microwave Plasma for Surface Texturing of Multicrystalline (<150 µm) Solar Substrates;Japanese Journal of Applied Physics;2012-10-01
4. Diagnostic and processing in SF6RF remote plasma for silicon etching;Journal of Physics D: Applied Physics;2009-08-19
5. Micromasking effect and nanostructure self-formation on the surface of lead chalcogenide epitaxial films on Si substrates during argon plasma treatment;Journal of Physics D: Applied Physics;2009-07-31
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