Fundamental Properties of Metal-Assisted Chemical Etching of Ge Surfaces Mediated by Dissolved O2 Molecules in Water
Author:
Affiliation:
1. Osaka University
Publisher
Surface Science Society Japan
Subject
General Earth and Planetary Sciences,General Engineering,General Environmental Science
Reference17 articles.
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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. A facile synthesis of shell-shaped GeOx (x≤2) islands by metal-assisted chemical etching of Ge and their optoelectronic properties;Optical Materials;2022-09
2. Metal-assisted chemical etching of Ge surface and its effect on photovoltaic devices;Applied Surface Science;2016-05
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