Mesoscopic-Scale and Small Strain Field beneath SiO2/Si Interface Revealed by a Multiple-Wave X-ray Diffraction Phenomenon - Depth of the Strain Field-Reference-Cited by-同舟云学术

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Mesoscopic-Scale and Small Strain Field beneath SiO2/Si Interface Revealed by a Multiple-Wave X-ray Diffraction Phenomenon - Depth of the Strain Field

Published:2011 Issue: Volume:9 Page:47-50
ISSN:1348-0391
Container-title:e-Journal of Surface Science and Nanotechnology
language:en
Short-container-title:e-J. Surf. Sci. Nanotechnol.

Author:

Yashiro Wataru¹,Yoda Yoshitaka²,Takahashi Toshio³,Teramoto Akinobu⁴,Hattori Takeo⁴,Miki Kazushi⁵

Affiliation:

1. Department of Advanced Materials Science, Graduate School of Frontier Sciences, the University of Tokyo, Japan

2. Japan Synchrotron Radiation Research Institute (JASRI), Japan

3. The Institute for Solid State Physics, The University of Tokyo, Japan

4. New Industry Creation Hatchery Center (NICHe), Tohoku University, Japan

5. Nanomaterials Laboratory (NML), National Institute for Materials Science (NIMS), Japan

Publisher

Surface Science Society Japan

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,Condensed Matter Physics,Bioengineering,Biotechnology

Link

http://www.jstage.jst.go.jp/article/ejssnt/9/0/9_0_47/_pdf

Reference39 articles.

1. [1] T. Emoto, K. Akimoto, A. Ichimiya, and K. Hirose, Appl. Surf. Sci. 190, 113 (2002).

2. Stress Relief as the Driving Force for Self-Assembled Bi Nanolines

3. Three-dimensional mapping of a deformation field inside a nanocrystal

4. Three-dimensional imaging of strain in a single ZnO nanorod

5. Non-destructive determination of local strain with 100-nanometre spatial resolution

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