Quantum-Well States in Ultra-Thin Metal Films on Semiconductor Surfaces-Reference-Cited by-同舟云学术

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Quantum-Well States in Ultra-Thin Metal Films on Semiconductor Surfaces

Published:2004 Issue: Volume:2 Page:169-177
ISSN:1348-0391
Container-title:e-Journal of Surface Science and Nanotechnology
language:en
Short-container-title:e-J. Surf. Sci. Nanotechnol.

Author:

Matsuda Iwao¹,Tanikawa Takehiro¹,Hasegawa Shuji¹,Yeom Han Woong²,Tono Kensuke³,Ohta Toshiaki³

Affiliation:

1. Department of Physics, School of Science, The University of Tokyo, Japan

2. Atomic-scale Surface Science Research Center and Institute of Physics and Applied Physics, Yonsei Univeristy, Korea

3. Department of Chemistry, School of Science, The University of Tokyo, Japan

Publisher

Surface Science Society Japan

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,Condensed Matter Physics,Bioengineering,Biotechnology

Link

http://www.jstage.jst.go.jp/article/ejssnt/2/0/2_0_169/_pdf

Reference33 articles.

1. [1] E.S. Meieran, Intel Technology Journal Q 4f98.

2. [2] 'Next Generation Manufacturing: A Framework for Action', Agility Forum, Bethlehem, PA, 1997.

3. [4] G.A. Prinz, Physics Today, April, 58 (1995).

4. [5] L. I. Schiff, 'Quantum Mechanics', 3rd ed. (McGraw- Hill, New York, 1968).

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